METHOD OF REMOVING MOISTURE FROM GASEOUS HYDROGEN CHLORIDE
	BOSNIK V B; ZHDANOV A A
	2023-05-02
专利权人	SILTRON LLC (SILT-Non-standard)
申请日期	2023-05-02
专利号	RU2825404-C1
成果简介	NOVELTY - Invention relates to a method of producing high-purity hydrogen chloride for further use in the microelectronic industry for producing semiconductor microcircuits. Method of removing moisture from gaseous hydrogen chloride involves passing the dried gas through a drying column with dispersed mineral absorbent material. Dehumidification is carried out by absorbing moisture with concentrated sulfuric acid of special purity. Mineral adsorbent used is grains of especially pure monocrystalline silicon, from the surface of which an oxide film is preliminarily removed. USE - Chemical or physical processes. ADVANTAGE - Simplified process of end product purification and improvement of its quality. 3 cl, 1 dwg
IPC 分类号	B01D-053/26 ; C01B-007/07
国家	俄罗斯
专业领域	材料科学
语种	英语
成果类型	专利
文献类型	科技成果
条目标识符	http://119.78.100.226:8889/handle/3KE4DYBR/21941
专题	中国科学院新疆生态与地理研究所
作者单位	SILTRON LLC (SILT-Non-standard)
推荐引用方式 GB/T 7714	BOSNIK V B,ZHDANOV A A. METHOD OF REMOVING MOISTURE FROM GASEOUS HYDROGEN CHLORIDE. RU2825404-C1[P]. 2023.

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