Producing a silicon dioxide film comprises obtaining a mixture of silicon-containing reagents and applying a coating by immersion followed by heat treatment
	DOROFEEVA S S; ROZHKOVA T V; VASILYEVA E G; KONDRASHIN K G; PETROV R A; SHOOTERS S P; IAROVAIA O V; DENISENKO A V
	2023-06-07
专利权人	HYDROGEN ECOPEROXIDE SCI & PRODN ASSOC (HYDR-Non-standard)
申请日期	2023-06-07
专利号	RU2023115067-A
成果简介	NOVELTY - Producing a silicon dioxide film comprises obtaining a mixture of silicon-containing reagents and applying a coating by immersion followed by heat treatment, where the silicon-containing compounds are a mixture of tetraethoxysilane and methyltrioxysilane with the addition of a modifying component of 9-phenanthrene triethoxysilane, 4-bi-phenylyl triethoxysilane, or 4-tri-ethoxysilyl benzene tri-ethoxysilane at a ratio of 2:(0.8-1.2) in a 10% mass solution of hydrochloric acid in isopropyl alcohol, and heat treatment is carried out at 400° C for 5 minutes. USE - The method is useful for producing a silicon dioxide film. ADVANTAGE - None given.
IPC 分类号	C03C-017/30 ; C09D-183/00
国家	俄罗斯
专业领域	材料科学
语种	英语
成果类型	专利
文献类型	科技成果
条目标识符	http://119.78.100.226:8889/handle/3KE4DYBR/21679
专题	中国科学院新疆生态与地理研究所
作者单位	HYDROGEN ECOPEROXIDE SCI & PRODN ASSOC (HYDR-Non-standard)
推荐引用方式 GB/T 7714	DOROFEEVA S S,ROZHKOVA T V,VASILYEVA E G,et al. Producing a silicon dioxide film comprises obtaining a mixture of silicon-containing reagents and applying a coating by immersion followed by heat treatment. RU2023115067-A[P]. 2023.

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