| METHOD OF REALIZING DEVICE FOR REAL-TIME SYNCHROTRON RESEARCH OF COATINGS SYNTHESIS PROCESSES BY VACUUM-ARC PLASMA-ASSISTED SPUTTERING | |
| 2023-12-25 | |
| 专利权人 | FEDERAL STATE BUDGETARY INST (FSBI-C) |
| 申请日期 | 2023-12-25 |
| 专利号 | RU2833300-C1 |
| 成果简介 | NOVELTY - Invention relates to use of synchrotron radiation for real-time analysis of phase composition, microstructure parameters, internal stresses in coatings on metal surface, sputtered by vacuum electron-plasma methods, and can be used for synthesis by these methods of increased thickness (~mcm) of heat-resistant, corrosion-resistant multilayer coatings, consisting of alternating solid, superhard nitride and oxide layers for aerospace, nuclear, machine building and other industries. Method of realizing a device for real-time synchrotron studies of processes of synthesis of coatings by vacuum-arc plasma-assisted sputtering is achieved by the fact that in the known method of synthesis of multilayer oxide-nitride coatings on materials and articles using synchrotron radiation in a vacuum chamber in a sputtering zone, a control sample is placed to obtain a coating diffractogram, alternating oxide and nitride layers of coating are successively sputtered by vacuum ion-plasma method, periodic survey of X-ray patterns of the coating on a reference sample is carried out during synthesis of the coating by means of synchrotron radiation. Simultaneously with the reference sample in the sputtering zone, the treated articles are placed for applying the identical coating, and X-ray patterns are taken on a reference sample with synchrotron radiation with photon energy of (1–40) keV and intensity of more than 0.5·108 phot/(s·mrad2). Obtained X-ray diffraction patterns are periodically controlled during synthesis of each coating layer by determining in it the value and sign of the macrostress until the value of the macrostress is reached, which is equal in magnitude to not more than 5·103 MPa, after which performing the transition to the synthesis of the next layer with macrostress of the same value, but with opposite sign, as a result providing minimum total value of macrostresses of multilayer coating and bringing coating thickness to specified value without its destruction and delamination. USE - Technological processes. ADVANTAGE - Possibility of determining the effect of vacuum-arc plasma-assisted sputtering conditions, including the effect of the flow of gas ions created by the additional source of gas ions on the parameters of the coating synthesized by this method on the surface of the material or article, as well as multiple reduction of development time and implementation of technologies of surface modification with required complex of physical-mechanical and functional properties on surface of structural and tool materials. 2 cl, 2 dwg |
| IPC 分类号 | C23C-014/06 ; G01N-023/20 ; H05H-001/24 |
| 国家 | 俄罗斯 |
| 专业领域 | 材料科学 |
| 语种 | 英语 |
| 成果类型 | 专利 |
| 文献类型 | 科技成果 |
| 条目标识符 | http://119.78.100.226:8889/handle/3KE4DYBR/18743 |
| 专题 | 中国科学院新疆生态与地理研究所 |
| 作者单位 | FEDERAL STATE BUDGETARY INST (FSBI-C) |
| 推荐引用方式 GB/T 7714 | DENISOV V V,KOVAL N N,RATAKHIN N A,et al. METHOD OF REALIZING DEVICE FOR REAL-TIME SYNCHROTRON RESEARCH OF COATINGS SYNTHESIS PROCESSES BY VACUUM-ARC PLASMA-ASSISTED SPUTTERING. RU2833300-C1[P]. 2023. |
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