Wavelength-tunable extreme UV diffraction grating for use in e.g. camera, has grating line patterns including grating heights and area, so that different grating densities and different duty cycles are formed on same substrate
	CHAKERA J A; MAHAPATRA S B; ANSARI A; KUMAR M; SINGHAL H; BANSAL D; BABU A
	2024-03-13
专利权人	INDIAN INST TECHNOLOGY BOMBAY (IITB-C)
申请日期	2024-03-13
专利号	IN202421018068-A
成果简介	NOVELTY - The grating has a substrate with a thickness of 250-500 micrometer. A set of metal deposit portions is provided atop the substrate. Grating line patterns from 833-2500 lines/millimeter including grating heights 10-40 nanometer and an area is provided so that different grating densities and different duty cycles are formed on the same substrate. The substrate is selected from a Silicon wafer, gallium nitride, Germanium and Sapphire. The metal is selected from Nickel, Gold, Palladium and Platinum, where the grating is formed by applying a resist material on the substrate, creating fine grating structure on the resist-coated substrate using electron beam lithography, and developing the resist. USE - Wavelength-tunable extreme UV diffraction grating for use in optical instruments e.g. cameras, telescopes, and spectrometers, and in spectrometry for separating and analyzing spectral components of light. ADVANTAGE - The grating incorporates cost-effective materials without compromising performance, thus establishing the grating as an economically feasible solution for broad implementation. The grating avoids a need for a separate mask, thus reducing overall cost of fabrication process. The grating is specifically tailored for scalability at university research facilities, thus allowing for customization and adaptation to different experimental setups and configurations. The grating is engineered to be size-adjustable, thus accommodating diverse spatial requirements and ensuring versatility across a range of experimental conditions. The grating allows electron beam lithography, metal deposition, and lift-off process to be carried out under 32 hours, and the testing to be done rapidly. The gratings are fabricated with varying line widths and periodicities, thus facilitating efficient characterization using higher order extreme UV laser pulses, thus minimizing vacuum acquisition time. The grating significantly improves overall optical performance, thus offering a superior alternative to existing solutions regarding precision and adaptability. DETAILED DESCRIPTION - INDEPENDENT CLAIM is also included for a method for fabrication of a wavelength-tunable extreme UV diffraction gratings.
IPC 分类号	G01J-003/18 ; G02B-005/18 ; G03F-007/20 ; G21K-001/06 ; H05G-002/00
国家	印度
专业领域	化学化工
语种	英语
成果类型	专利
文献类型	科技成果
条目标识符	http://119.78.100.226:8889/handle/3KE4DYBR/17749
专题	中国科学院新疆生态与地理研究所
作者单位	INDIAN INST TECHNOLOGY BOMBAY (IITB-C)
推荐引用方式 GB/T 7714	CHAKERA J A,MAHAPATRA S B,ANSARI A,et al. Wavelength-tunable extreme UV diffraction grating for use in e.g. camera, has grating line patterns including grating heights and area, so that different grating densities and different duty cycles are formed on same substrate. IN202421018068-A[P]. 2024.

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