| MAGNETRON TARGET FOR DEPOSITING FILM OF BINARY ALLOY Ta less than sub greater than x less than /sub greater than Ti less than sub greater than 1-x less than /sub greater than | |
| 2024-04-19 | |
| 专利权人 | UNIV MISIS NAT SCI & TECHNOLOGY (UMNS-C) |
| 申请日期 | 2024-04-19 |
| 专利号 | RU2834411-C1 |
| 成果简介 | NOVELTY - Invention relates to a magnetron target for depositing a film of a binary alloy from tantalum and titanium TaxTi1-x, wherein x>0.5. Said target comprises two metal plates arranged parallel to each other and made with possibility of rigid attachment to magnetron coaxially with it. Internal cooled plate is made of titanium, and the external plate is made of tantalum. In the outer plate there are two slots in the form of ring sectors with an angle of less than 120°. Said slots are located symmetrically relative to the centre of the target. USE - Metallurgy. ADVANTAGE - Enabling creation of a magnetron target, which enables to deposit films from a binary alloy TaxTi1-x at x>0.5. 1 cl, 4 dwg, 1 ex |
| IPC 分类号 | C23C-014/14 ; C23C-014/35 |
| 国家 | 俄罗斯 |
| 专业领域 | 材料科学 |
| 语种 | 英语 |
| 成果类型 | 专利 |
| 文献类型 | 科技成果 |
| 条目标识符 | http://119.78.100.226:8889/handle/3KE4DYBR/17096 |
| 专题 | 中国科学院新疆生态与地理研究所 |
| 作者单位 | UNIV MISIS NAT SCI & TECHNOLOGY (UMNS-C) |
| 推荐引用方式 GB/T 7714 | IVANOV N M,SHAPOVALOV V I,SHARKOVSKII D S. MAGNETRON TARGET FOR DEPOSITING FILM OF BINARY ALLOY Ta less than sub greater than x less than /sub greater than Ti less than sub greater than 1-x less than /sub greater than. RU2834411-C1[P]. 2024. |
| 条目包含的文件 | 条目无相关文件。 | |||||
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