| DEVICE FOR HYDROMECHANICAL AND MEGASONIC PROCESSING OF SEMICONDUCTOR WAFERS | |
| 2024-09-24 | |
| 专利权人 | SEMICONDUCTOR DEVICES RES INST STOCK CO (SEMI-Non-standard) |
| 申请日期 | 2024-09-24 |
| 专利号 | RU2834616-C1 |
| 成果简介 | NOVELTY - Invention relates to cleaning the surface of flat articles using a hydromechanical and mega-sonic method using a detergent solution and can be used in semiconductor production when making ICs, LSICs and VLSICs prior to photolithography. Substance of the invention consists in the fact that in the device for hydromechanical and mega-sound processing of semiconductor plates, comprising a base plate, in which there are built-in: a processing unit with a bath and a drive with a centrifuge, on the shaft of which there is a vacuum table for placing the processed plate; brush drive vertical movement mechanism with a brush rotation drive, on which a brush with a collector for supplying deionised water and solution to the brush is fixed; mechanism for vertical movement of a mega-sound nozzle based on a pneumatic drive, including a mega-sound nozzle with a channel for supplying water to the nozzle, a plate centring unit with centring brackets is additionally introduced, a mechanism for vertical movement of the centrifuge, a mechanism for turning the brush, a mechanism for turning a megasonic nozzle, wherein the mechanism for vertical movement of the brush is based on a step motor, and the nozzle has a channel for supplying a detergent solution. USE - Cleaning. ADVANTAGE - Improved quality of processing and shorter drying time for semiconductor wafers, which increases efficiency of equipment based on the disclosed device. 1 cl, 3 dwg |
| IPC 分类号 | B08B-003/04 ; H01L-021/306 |
| 国家 | 俄罗斯 |
| 专业领域 | 材料科学 |
| 语种 | 英语 |
| 成果类型 | 专利 |
| 文献类型 | 科技成果 |
| 条目标识符 | http://119.78.100.226:8889/handle/3KE4DYBR/15064 |
| 专题 | 中国科学院新疆生态与地理研究所 |
| 作者单位 | SEMICONDUCTOR DEVICES RES INST STOCK CO (SEMI-Non-standard) |
| 推荐引用方式 GB/T 7714 | KOMAROV N V,VLASOV A O,LACHUGIN V G,et al. DEVICE FOR HYDROMECHANICAL AND MEGASONIC PROCESSING OF SEMICONDUCTOR WAFERS. RU2834616-C1[P]. 2024. |
| 条目包含的文件 | 条目无相关文件。 | |||||
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