Method for designing and fabricating a rotary spark gap switch, involves comparing germination rates, plant growth, and yield between plasma-treated and untreated seeds addressing food scarcity issues with seeds
	VARSHINI C; SRINIVAS N; BHARATH S P; GOWDA J B S; NATARAJ K R; KUMAR S R; ANGURAJA R
	2024-10-16
专利权人	VARSHINI C (VARS-Individual) ; SRINIVAS N (SRIN-Individual) ; BHARATH S P (BHAR-Individual) ; GOWDA J B S (GOWD-Individual) ; NATARAJ K R (NATA-Individual) ; KUMAR S R (KUMA-Individual) ; ANGURAJA R (ANGU-Individual) ; DON BOSCO TECHNOLOGY INST (DONB-Non-standard)
申请日期	2024-10-16
专利号	IN202441078520-A
成果简介	NOVELTY - The method involves development of a rotary sparkgap switch for plasma generation represents a novel application of high voltage direct current (HVDC) technology in agriculture. The plasma treatment significantly is improved the rate of seed germination compared to untreated seeds. The plants are grown from plasma-treated seeds exhibit faster growth and higher yield. The technology offers a viable solution to reduce the harvesting period and boost crop production, benefiting farmers and addressing food scarcity issues. USE - Method for designing and fabricating a rotary sparkgap switch for generating high-voltage impulse pulses in a plasma reactor for agricultural applications. ADVANTAGE - The method enables designing and fabricating the RSGS for generating high-voltage impulse pulses, optimizing plasma treatment parameters for enhancing seed germination and growth, and comparing germination rates, plant growth and yield between plasma-treated and untreated seeds. The method allows the seeds treated with plasma to show improved growth characteristics compared to untreated seeds, thus leading to increased agricultural yields, and hence benefiting farmers by enabling faster crop production and addressing global food supply challenges. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for the method of claim further comprising! Design and Fabrication of Rotary Spark Gap Switch for Plasma Applications Study on Seed Germination: Plasma treatment significantly improves the rate of seed germination compared to untreated seeds.
IPC 分类号	A01C-001/02 ; A01C-001/06 ; H01T-007/00 ; H05F-003/04 ; H05H-001/24
国家	印度
专业领域	能源矿产
语种	英语
成果类型	专利
文献类型	科技成果
条目标识符	http://119.78.100.226:8889/handle/3KE4DYBR/14860
专题	中国科学院新疆生态与地理研究所
作者单位	1.VARSHINI C (VARS-Individual) 2.SRINIVAS N (SRIN-Individual) 3.BHARATH S P (BHAR-Individual) 4.GOWDA J B S (GOWD-Individual) 5.NATARAJ K R (NATA-Individual) 6.KUMAR S R (KUMA-Individual) 7.ANGURAJA R (ANGU-Individual) 8.DON BOSCO TECHNOLOGY INST (DONB-Non-standard)
推荐引用方式 GB/T 7714	VARSHINI C,SRINIVAS N,BHARATH S P,et al. Method for designing and fabricating a rotary spark gap switch, involves comparing germination rates, plant growth, and yield between plasma-treated and untreated seeds addressing food scarcity issues with seeds. IN202441078520-A[P]. 2024.

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